Vacuum Exhaust Simulation Software "DSMC-Neutrals"
Analysis software capable of simulating vacuum exhaust and analyzing gas flow under low-pressure conditions, also compatible with rarefied gases (rarefied fluids).
**Features** - Adopts unstructured mesh, allowing for calculations that directly reflect the complex shapes of actual devices. - High parallel efficiency enables quick computation results even for large-scale geometries. - Utilizes a particle method, ensuring convergence to a solution even with poor-quality computational grids, unlike fluid models. - Comprehensive technical support ensures that even those new to simulation or busy with experiments can reliably achieve results. **Supports Various Cases** - Simulation of rarefied gas flow in a vacuum chamber. - Simulation of thin film generation in semiconductor manufacturing. - Chemical vapor deposition (CVD), organic light-emitting diode (OLED), molecular beam epitaxy (MBE). - Film deposition simulations involving chemical reactions like CVD. **Outputs Various Computational Results** - Calculations of chemical reactions. - Calculation of chemical reactions from Arrhenius-type reaction data. - Calculations of dissociation, recombination, and molecular (atomic) exchange reactions. - Ability to set multiple reaction equations on the GUI. *For more details, please refer to the catalog or feel free to contact us.*
- Company：ウェーブフロント 本社
- Price：Other
